Addition of Functional Characteristics of Organic Photochromic Dye to Nano-Structures by Selective Doping on a Polymer Surface
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概要
- 論文の詳細を見る
Functional characteristics of an organic photochromic dye were added to nano-structures of a diblock copolymer by selective doping using the "vapor transportation method" with vacuum technique. The photochromic compound cis-1,2-dicyano-1,2-bis(2,4,5-trimethyl-3-thienyl)ethene (CMTE) was dispersed into polystyrene (PS), poly(methyl methacrylate) (PMMA), and polycarbonate (PC) substrates, and the rates of production of CMTE-containing layers were as follows: PS $>$ PC $>$ PMMA. The differences in formation rate between polymer matrices can lead to selective dispersal of CMTE into the PS nano-domains of a PS-block-PMMA film with a micro phase separation structure, resulting in addition of the photochromic characteristics of CMTE to PS nano-structures of the PS-block-PMMA film.
- Japan Society of Applied Physicsの論文
- 2003-08-01
著者
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Xiaoliang Mo
Photonic Device Application Group National Institute Of Advanced Industrial Science And Technology
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HORIUCHI Shin
Macromolecular Technology Research Center, National Institute of Advanced Industrial Science and Tec
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TANAKA Norio
Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST
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Mizokuro Toshiko
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology
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Hiraga Takashi
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology
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Mochizuki Hiroyuki
Photonics Research Institutes National Institute Of Advanced Industrial Science And Technology
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Tanigaki Nobutaka
Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Tanigaki Nobutaka
Photonic Device Application Group, National Institute of Advanced Industrial Science and Technology, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Hiraga Takashi
Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Hiraga Takashi
Photonic Device Application Group, National Institute of Advanced Industrial Science and Technology, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Mochizuki Hiroyuki
Photonic Device Application Group, National Institute of Advanced Industrial Science and Technology, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Xiaoliang Mo
Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Horiuchi Shin
Macromolecular Technology Research Center, National Institute of Advanced Industrial Science and Technology (AIST), 2-41-6 Aomi, Koto-ku, Tokyo 135-0064, Japan
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Tanaka Norio
Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Mizokuro Toshiko
Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Mizokuro Toshiko
Photonic Device Application Group, National Institute of Advanced Industrial Science and Technology, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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