Fabrication of Fluorescence Micropatterns to Photoresists by Selective Doping of Fluorescent Dye Using Vapor Transportation Method

概要

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We report a novel patterning process that adds fluorescence to a positive-type photoresist by doping vapor of the fluorescent dye, 4-(dicyanomethylene)-2-methyl-6-(4-dimethylaminostyryl)4H-pyran (DCM), using a simple vacuum process called vapor transportation method. DCM-doped photoresist films were examined by UV-vis absorption spectroscopy, fluorescent spectroscopy, and optical microscopy. When DCM vapor was used to dope unexposed films at temperatures above 140°C, absorption and fluorescence peaks due to DCM were detected. In contrast, when DCM vapor was used to dope exposed films, no absorption and only weak fluorescence peaks were detected. These results indicated the selective doping of DCM vapor into unexposed photoresist films. When DCM vapor reached the surfaces of micropatterned photoresist films with both unexposed and exposed areas, DCM was doped selectively into the unexposed areas of the films, resulting in the production of micropatterns with DCM molecules in the patterned films.
INSTITUTE OF PURE AND APPLIED PHYSICSの論文
2005-11-10