Interface Structures between Polymer Substrates and Fluorescent Dye-Doped Polymer Layers Formed by Vaporization in Vacuum
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概要
- 論文の詳細を見る
We have developed a simple vacuum process, termed the "vapor transportation method," to dope low-molecular-weight molecules into polymer molds by vaporization of the molecules in a vacuum. In this study, we fabricated interfacial structures with a concentration gradient, between polystyrene (PS) substrates and dye-doped PS regions. PS was used to prepare cylindrical molds and molds surrounded by quartz cells. Fluorescent dyes, 4-(dicyanomethylene)-2-methyl-6-(4-dimethylaminostyryl)4H-pyran (DCM), were doped into the cylindrical molds and into the molds surrounded by quartz cells from 110 to 160°C. To confirm the DCM doping of PS, UV-vis and fluorescent spectra were measured. To confirm the interfacial structures of the doped dyes, the dye-doped PS molds were examined by optical microscopy, transmission Fourier transform infrared (FT-IR) microscopy, and microspectrophotometry. The intensity profiles of DCM fluorescence from the DCM-doped molds surrounded by quartz cells by microspectrophotometry, show that, as doping temperature increases, interfacial structures had an increase in concentration gradient, in agreement with the results from optical microscopy and transmission FT-IR microscopy.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-01-15
著者
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Mizokuro Toshiko
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology
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Mo Xiaoliang
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology (aist)
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Tanigaki Nobutaka
Photonic Device Application Group, National Institute of Advanced Industrial Science and Technology, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Hiraga Takashi
Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Hiraga Takashi
Photonic Device Application Group, National Institute of Advanced Industrial Science and Technology, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Mochizuki Hiroyuki
Photonic Device Application Group, National Institute of Advanced Industrial Science and Technology, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Mo Xiaoliang
Photonic Device Application Group, National Institute of Advanced Industrial Science and Technology, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Mo Xiaoliang
Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Mizokuro Toshiko
Photonic Device Application Group, National Institute of Advanced Industrial Science and Technology, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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