Spray Beam Analysis in Vacuum Spray Method for Deposition of Thin Organic Films
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概要
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We report the investigation of a spray beam and the initial stage of thin-film preparation in a vacuum spray method. As the key parts, two types of orifice plate with pinholes with diameters of 10 and 20 μm were used in the spray nozzle. The spray solution beam in a vacuum chamber was irradiated with a green laser. By measuring the length of the laser-scattered part, the divergence angle of the spray beam and the relationship between the beam width and spray pressure were investigated. After diluted poly[2-methoxy-5-(2$'$-ethylhexoxy)-1,4-phenylenevinylene] (MEH-PPV) in a chloroform solution was injected onto the heated substrates in a short time period, the MEH-PPV particles on the substrates were analyzed by optical microscopy and atomic force microscopy (AFM). Compared with the orifice plate with a pinhole with a diameter of 20 μm, the 10-μm-orifice plate generated a spray beam with a big divergence angle, and the MEH-PPV particles on the substrate were smaller and more uniform in size.
- 2008-01-25
著者
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Mizokuro Toshiko
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology
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Hiraga Takashi
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology
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Mo Xiaoliang
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology (aist)
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Tanigaki Nobutaka
Photonic Device Application Group, National Institute of Advanced Industrial Science and Technology, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Umehara Noboru
Technical Support Co., Ltd., 7000-71 Technoland, Hosoe-cho, Kita-ku, Hamamatu 431-1304, Japan
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Takagi Kazuyoshi
Technical Support Co., Ltd., 7000-71 Technoland, Hosoe-cho, Kita-ku, Hamamatu 431-1304, Japan
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Yamamoto Sumio
Technical Support Co., Ltd., 7000-71 Technoland, Hosoe-cho, Kita-ku, Hamamatu 431-1304, Japan
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Hiraga Takashi
Photonic Device Application Group, National Institute of Advanced Industrial Science and Technology, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Mo Xiaoliang
Photonic Device Application Group, National Institute of Advanced Industrial Science and Technology, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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Mizokuro Toshiko
Photonic Device Application Group, National Institute of Advanced Industrial Science and Technology, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
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