Thickness measurement of surface layer by the angular dependent X-ray photoelectron spectroscopy.
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概要
- 論文の詳細を見る
A sample-holding device to study the photoelectron take-off angle dependence of XPS spectrum is described. The take-off angle dependence was studied on a silicon surface covered with an oxide layer and a contamination carbon layer, and the (thickness)/(electron attenuation length) ratio of each layer was determined from the analysis of the angular dependence of the Si2p, O1s, and C1s peak intensities.
- 公益社団法人 日本化学会の論文
著者
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Kuroda Haruo
Department Of Chemistry Faculty Of Science The University Of Tokyo
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Yamada Masamichi
Department Of Biological Science And Technology Science University Of Tokyo
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Yamada Masamichi
Department of Chemistry, Faculty of Science, The University of Tokyo
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