同時スパッタ法を利用した強磁性体用プレーナマグネトロンスパッタ装置

概要

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A planar magnetron sputtering system for ferromagnetic targets is constructed for trial purposes and its DC discharge and sputtering characteristics and leakage magnetic field distributions are investigated for various currents of solenoid coil around a cylindrical pyrex chamber. Co-sputtering technique is proposed using a ferromagnetic or a non-magnetic cap-shaped target covered the SUS-304 cap for cooling a N-pole and a ferromagnetic washer-shaped target in this work. Four combinations of these targets are employed as follows : (a) Fe cap and Fe washer of 3 mm thickness, (b) Al cap and Fe washer of 3 mm thickness, (c) Al cap and Fe washer of 1 mm thickness and (d) Al cap and Ni washer of 1 mm thickness. The Ar gas pressures possible to discharge in the case of (a), (b) and (c) - (d) are 3-10 Pa, 0.2-3 Pa and 0.1-3 Pa respectively. And the deposition rates at 50W (DC power) in using (a), (b), (c) and (d) are 0.2-0.3 μm/h, 1.0-1.3 μm/h, 1.0-1.2 μm/h and 1.6-1.7 μm/h respectively.
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