S1303-1-3 変調照明シフトによる微細加工構造の超解像光学式計測法に関する研究(加工計測・評価システム(1))

概要

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Microfabricated structures such as semiconductors and MEMS keep shrinking as nanotechnology advances. Demand that measures microfabricated structures has risen. The optics and electron beam have been mainly used for that purpose, but the resolving power of the optics is limited by the Rayleigh limit and it is generally low for defects at sub-wavelength geometries, while the scanning electron microscope needs vacuum and induces contamination in measurement. In order to find a solution to these problems, we propose the novel optical inspecting method for the microfabricated structure using standing wave shift. This method is based on a super-resolution algorithm in which the inspection system's resolution exceeds the Rayleigh limit by shifting standing wave with the piezoelectric actuator. In this report, we carried out simulation and basic experiment of 2-dimensional super-resolution.
2009-09-12