Effect of annealing on the microstructure of FePt thin film(PMR media,The 8th Asian Symposium on Information Storage Technology (ASIST-8))
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概要
- 論文の詳細を見る
FePt-alloy thin films sputter deposited at room temperature on surface oxidized Si substrates were annealed at 300-500℃ in vacuum. The film microstructure was observed by using a transmission electron microscope (TEM) in the plan-view and the cross-sectional view to investigate the crystal grain growth and the ordering processes of FePt-alloy thin film. The results show that atom rearrangement in the crystal grain is going on while increasing the crystal grain diameter.
- 社団法人電子情報通信学会の論文
- 2006-11-02
著者
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Murayama Norio
Faculty Of Science And Engineering Chuo Univ.
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TAKAHASHI Yoshio
Central Research Laboratory, Hitachi, Ltd.
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Futamoto Masaaki
Faculty Of Science And Engineering Chuo Univ.
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Takahashi Yoshio
Central Research Lab. Hitachi Ltd.
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