Preparation and Structural Characterization of hcp and fcc Ni Epitaxial Thin Films on Ru Underlayers with Different Orientations
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概要
- 論文の詳細を見る
Ni epitaxial films are prepared by ultrahigh vacuum rf magnetron sputtering on Ru underlayers of (11\bar{2}0), (1\bar{1}00), and (0001) grown hetero-epitaxially on MgO single-crystal substrates of (100), (110), and (111) orientations, respectively. The film growth behavior and the crystallographic properties are studied by in-situ reflection high energy electron diffraction and pole figure X-ray diffraction. Metastable hcp-Ni(11\bar{2}0) and hcp-Ni(1\bar{1}00) crystals respectively nucleate on Ru(11\bar{2}0) and Ru(1\bar{1}00) underlayers, where the hcp crystals are stabilized through hetero-epitaxial growth. With increasing the film thickness, the hcp structure in the Ni films starts to transform into more stable fcc structure by atomic displacement parallel to the hcp(0001) close-packed plane. The resulting films consist of hcp and fcc crystals. On the other hand, only fcc crystal formation is observed for the Ni film grown on Ru(0001) underlayer.
- 2011-06-25
著者
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SATO Yoichi
Faculty of Pharmaceutical Sciences, The University of Tokushima
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OHTAKE Mitsuru
Faculty of Science and Engineering, Chuo University
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Futamoto Masaaki
Faculty Of Science And Engineering Chuo Univ.
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Higuchi Jumpei
Faculty of Science and Engineering, Chuo University, 1-13-27 Kasuga, Bunkyo, Tokyo 112-8551, Japan
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Nishiyama Tsutomu
Faculty of Science and Engineering, Chuo University, 1-13-27 Kasuga, Bunkyo, Tokyo 112-8551, Japan
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Sato Yoichi
Faculty of Science and Engineering, Chuo University, 1-13-27 Kasuga, Bunkyo, Tokyo 112-8551, Japan
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Ohtake Mitsuru
Faculty of Science and Engineering, Chuo University, 1-13-27 Kasuga, Bunkyo, Tokyo 112-8551, Japan
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Futamoto Masaaki
Faculty of Science and Engineering, Chuo University, 1-13-27 Kasuga, Bunkyo, Tokyo 112-8551, Japan
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