マグネトロンスパッタリング法により形成したホウ素含有薄膜の機械的特性

概要

論文の詳細を見る
Thin films containing boron have been prepared on silicon substrates by DC magnetron sputtering using a sintered B_4C target. The influences of N_2 or H_2 addition as a plasma gas on nanoindentation hardness, adhesive strength to the substrate and the friction coefficient of the films are investigated. Nanoindentation studies show that N_2 addition in the film formation process leads to a lower hardness of the film. The lack of a three-dimensional B-C-N network in the films is thought to be a reason for the deterioration in the nanoindentation hardness of the films. On the other hand, the adhesive strength is increased significantly by N_2 or H_2 addition in the film formation process, although the frictional properties of the film against a steel ball in an ambient atmosphere are not improved in this study.
東海大学の論文
2005-09-30