Backscattering Spectrometry on Ar Sputter-Deposited Films
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概要
- 論文の詳細を見る
Both chemical components of films and Ar concentration introduced through Ar sputtering are examined by means of He^+ backscattering spectrometry. A considerable amount of Ar is taken and distributed uniformly in amorphous Si and amorphous Fe-Co alloys with various metalloids, while no trace of Ar can be detected in crystalline Fe. The stability of Ar introduced in the films has also been examined by the change in Ar distribution in depth on thermal annealings.
- 東北大学の論文
著者
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Kazama Noriaki
The Research Institute For Iron Steed And Other Metals Tohoku University
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Fujimori Hiroyasu
The Research Institute For Electric And Magnetic Materials
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Fujino Yutaka
Faculty Of Engineering Tohoku University
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Yamaguchi Sadae
Faculty Of Engineering Tohoku University
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Fujimori Hiroyasu
The Resarch Institute For Iron Steel And Other Metals
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