Effects of Discharge Frequency in Plasma Etching and Ultrahigh-Frequency Plasma Source for High-Performance Etching for Ultralarge-Scale Integrated Circuits

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2000-04-15

著者

• Malyshev Mikhail

  Bell Laboratories Lucent Technologies

• Samukawa Seiji

  Silicon Systems Research Laboratories Nec Corporation

• DONNELLY Vincent

  Bell Laboratories, Lucent Technologies

• Donnelly Vincent

  Bell Laboratories Lucent Technologies

• SAMUKAWA Seiji

  Silicon Systems Research Laboratories, NEC Corporation

• MALYSHEV Mikhail

  Bell Laboratories, Lucent Technologies

関連論文

• Dependence of Electron Energy Distributions on Discharge Pressure in Ultrahigh-Frequency and Inductive-Coupled Cl_2 Plasmas
• Effects of Discharge Frequency in Plasma Etching and Ultrahigh-Frequency Plasma Source for High-Performance Etching for Ultralarge-Scale Integrated Circuits
• Trace Rare Gases Optical Emission Spectroscopy for Determination of Electron Temperatures and Species Concentrations in Chlorine-Containing Plasmas
• Charge-Free and Dopant Dependence-Free Etching Processes Using Non-Maxwellian Electron Energy Distributions in Ultra-High-Frequency Plasma
• Effects of Degree of Dissociation on Aluminum Etching in High-Density Cl_2 Plasmas
• Enhancement of Reactivity in Au Etching by Pulse-Time-Modulated Cl2 Plasma
• Trace Rare Gases Optical Emission Spectroscopy for Determination of Electron Temperatures and Species Concentrations in Chlorine-Containing Plasmas

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