Trace Rare Gases Optical Emission Spectroscopy for Determination of Electron Temperatures and Species Concentrations in Chlorine-Containing Plasmas
スポンサーリンク
概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1998-04-01
著者
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Malyshev Mikhail
Bell Laboratories Lucent Technologies
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Kornblit Avi
Bell Laboratories Lucent Technologies
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DONNELLY Vincent
Bell Laboratories, Lucent Technologies
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Donnelly Vincent
Bell Laboratories Lucent Technologies
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CIAMPA Nicolas
Bell Laboratories, Lucent Technologies
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COLONELL Jennifer
Bell Laboratories, Lucent Technologies
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LEE John
Bell Laboratories, Lucent Technologies
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Ciampa Nicolas
Bell Laboratories Lucent Technologies
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Colonell Jennifer
Bell Laboratories Lucent Technologies
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Lee John
Bell Laboratories Lucent Technologies
関連論文
- Effects of Discharge Frequency in Plasma Etching and Ultrahigh-Frequency Plasma Source for High-Performance Etching for Ultralarge-Scale Integrated Circuits
- Trace Rare Gases Optical Emission Spectroscopy for Determination of Electron Temperatures and Species Concentrations in Chlorine-Containing Plasmas
- Trace Rare Gases Optical Emission Spectroscopy for Determination of Electron Temperatures and Species Concentrations in Chlorine-Containing Plasmas