Surface Analysis for Selective SiO_2 Etching by Reflectance Photoelastic Modulated Fourier Transform Infrared Spectroscopy : Nuclear Science, Plasmas, and Electric Discharges
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2001-10-15
著者
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Moon Joo-tae
Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Moon Joo-tae
Semiconductor R&d Center Sawsung Electronics Co. Ltd.
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Doh H‐h
Univ. Tokyo Tokyo Jpn
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Chi Kyeong-koo
Semiconductor R&d Center Sawsung Electronics Co. Ltd.
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DOH Hyun-Ho
Semiconductor R&D Center, Sawsung Electronics Co., Ltd.
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CHU Changwoong
Semiconductor R&D Center, Sawsung Electronics Co., Ltd.
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Chu Changwoong
Semiconductor R&d Center Sawsung Electronics Co. Ltd.
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Doh Hyun-Ho
Semiconductor R&D Center, Sawsung Electronics Co., Ltd.
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- Surface Analysis for Selective SiO_2 Etching by Reflectance Photoelastic Modulated Fourier Transform Infrared Spectroscopy : Nuclear Science, Plasmas, and Electric Discharges