Preparation of MnBi by Enhanced Activated Reactive Evaporation Process

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1981-04-05

著者

• Okada Ikuo

  Musashino Electrical Communication Laboratory Nippon Telegraph And Telephon Public Corporation

• Yoshihara Hideo

  Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation

• Yoshihara Hideo

  Musashino Electrical Communication Laboratory Nippon Telegraph And Telephon Public Corporation

関連論文

• Very Steep Profile Resist Pattern Preparation by Reactive Ion Etching with Ar+CH_4 Gas Mixture
• Preparation of MnBi by Enhanced Activated Reactive Evaporation Process
• Silicon Nitride Single-Layer X-Ray Mask
• Preparation of Si-C Films by Plasma Deposition Process with Neutralization
• X-Ray Silicon Target Preparation for X-Ray Lithographic System
• Effects of Photoelectrons and Auger Electrons on Contrast and Resolution in X-Ray Lithography
• Synthesis of Titanium Nitride by Enhanced ARE Process
• Ion Effect on γ-Al_2O_3 Films by Enhanced ARE Process
• Synthesis of SiC Films by Plasma Deposition Process

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