Advanced Thermal Improvement Method for Chemically Amplified Resists
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概要
- 論文の詳細を見る
We have developed a new method to achieve both, thermal durability and critical dimension (CD) control using short-duration, deep UV irradiation for chemically amplified resists at moderate irradiation intensity and moderate substrate temperature. We obtained thermal durability up to 140℃ and CD control within ±5% between as-developed resists and those obtained after baking at 140℃.
- 社団法人応用物理学会の論文
- 1997-12-30
著者
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Endo Masayuki
Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Katsuyama Akiko
Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Yamanaka Michinari
Ulsi Process Technology Development Center Matsushita Electronics Corporation
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Yamanaka Michinari
Ulsi Process Technology Development Center Matsushita Electric Industrial Co. Ltd.
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