Application of a New Adhesion Promoter to Stable Chemically Amplified Resist Pattern Fabrication on Boron Phosphorus Silicate Glass Substrates
スポンサーリンク
概要
- 論文の詳細を見る
We have developed a new, non-ammonia generating adhesion promoter, 4-trimethylsiloxy-3-pentene-2-one. Its adhesion ability to a substrate is superior to the conventional adhesion promoter, hexamethyldisilazane, due to its high reactivity. We obtained high-aspect-ratio and precise chemically amplified resist patterns on boron phosphorus silicate glass (BPSG) substrates using this new adhesion promoter.
- 社団法人応用物理学会の論文
- 1997-12-30
著者
-
Endo Masayuki
Ulsi Process Technology Development Center Matsushita Electronics Corporation
-
Katsuyama Akiko
Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corporation
-
Katsuyama Akiko
Ulsi Process Technology Development Center Matsushita Electronics Corporation
関連論文
- Design Concepts of Single-Layer Resists for Vacuum Ultraviolet Lithography
- Application of a New Adhesion Promoter to Stable Chemically Amplified Resist Pattern Fabrication on Boron Phosphorus Silicate Glass Substrates
- Advanced Thermal Improvement Method for Chemically Amplified Resists