The Effect of Electrode on the C-V Hysteresis Behavior of MAS and MAOS Structures

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1972-04-05

著者

• Tsujide Tohru

  Ic Division Nippon Electric Co. Ltd.

• IIDA Kiyoto

  IC Division, Nippon Electric Co., Ltd.

• Iida Kiyoto

  Ic Division Nippon Electric Co. Ltd.

関連論文

• An Instability of MAOS Structures
• Effects of the Al_2O_3 Film on the Electrical Characteristics of the Planar p-n Junctions
• The Effects of X-Ray Irradiation on MAS Diodes
• Influence of Al_2O_3 Deposition Temperature on Charge-Storage and Retention in MA(O)S Structures
• The Effect of Electrode on the C-V Hysteresis Behavior of MAS and MAOS Structures
• The Effects of Heat Treatment on the Interface Characteristics in the Si-Al_2O_3 and Si-SiO_2-Al_2O_3 Systems
• Physical and Chemical Properties of Aluminum Oxide Film Deposited by AlCl_3-CO_2-H_2 System
• Partial Charge Accumulation of MAOS Structures

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