PIG-Type Compact Microwave Metal Ion Source
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概要
- 論文の詳細を見る
A compact microwave metal ion source using PIG (Penning lonization Gauge) geometry has been newly developed. This modified PIG ion source introduces a microwave discharge and can generate stable and high density plasma. The size of the source is 60 mm in diameter and 80 mm long. The microwave discharge power is 20〜60 W at a frequency of 2.45 GHz. A tantulum ion beam current of 3.2 μA has been measured with the extraction aperture (2 mm diameter) at an extraction voltage of 13 kV.
- 社団法人応用物理学会の論文
- 1987-02-20
著者
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Hirofuji Yuichi
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
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Hirofuji Yuichi
Semiconductor Reseach Center Matsushita Electric Industrial Co. Ltd.
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YOSHIDA Yoshikazu
Production Engineering Laboratories, Matsushita Electric Industrial Co., Ltd.
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SUZUKI Naoki
Production Engineering Laboratories, Matsushita Electric Industrial Co., Ltd.
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ONISHI Teruhito
Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.
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Suzuki Naoki
Production Engineering Laboratories Matsushita Electric Industrial Co. Ltd.
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Onishi Teruhito
Semiconductor Research Center Matsushita Electric Industrial Co. Ltd.
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Yoshida Yoshikazu
Production Engineering Laboratories Matsushita Electric Industrial Co. Ltd.
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- Low-Energy Double-Ion -Beam Deposition System
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