Selective Dissociative Ionization of SiH_4, Si_2H_6 and Si_3H_8 by Electron Impact in Supersonic Free Jets

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1993-06-15

著者

• Fons P

  Optoelectronic Materials And Devices Group Photonics Research Institute National Institute Of Advanc

• Abe Hiroshi

  Institute for Materials Research, Tohoku University

• Fons P

  National Inst. Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn

• Fons Paul

  Institute Of Applied Physics University Of Tsukuba

• MOTOOKA Teruaki

  Institute of Applied Physics, University of Tsukuba

• TOKUYAMA Takashi

  Institute of Applied Physics, University of Tsukuba

• Motooka T

  Kyushu Univ. Fukuoka Jpn

• Tokuyama T

  Institute Of Applied Physics University Of Tsukuba

• Abe Hiroshi

  Institute Of Applied Physics University Of Tsukuba

• Abe Hiroshi

  Institute of Applied Physics, University of Tsukuba

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