Thermally Activated Conductivity of Hydrogenated Amorphous Carbon Films Induced by Argon Plasma Bombardment

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概要

• 論文の詳細を見る

• Hydrogenated amorphous carbon films have been prepared from plasma-enhanced chemical vapor deposition. Both the as-deposited films and those thermally annealed for two hours at 300℃ exhibited insulating characteristics. Neither a thermally activated process nor a hopping mechanism was observed for the conductivity. An increase occurred in the conductivity by an order of five after two hours of subsequent treatment under Ar plasma for both the as-deposited and thermally annealed films. In addition, thermally activated conductivity with an activation energy of around 0.3 eV was observed.

• 社団法人応用物理学会の論文
• 1993-04-01

著者

• Wu Pu-wei

  Department Of Materials Science And Engineering National Tsing Hua University

• Chou L‐h

  National Tsing Hua Univ. Hsinchu Twn

• Chou Lih-hsin

  Department Of Materials Science And Engineering Narional Tsing Hua University

• HSIEH Wu-Tzung

  Department of Materials Science and Engineering, National Tsing Hua University

• Hsieh Wu-tzung

  Department Of Materials Science And Engineering National Tsing Hua University

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