Critical Current and Activation Energy in Bi_2Sr_2Ca_1Cu_2O_x Films after Ion Irradiation
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1990-11-20
著者
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KUBO Yoshimi
Fundamental Research Laboratories, NEC Corporation
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Kubo Yoshimi
Fundamental Research Laboratories Nec Corporation
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Kubo Yoshimi
Fundamental Res. Labs. Nec Corp.
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Miura S
Tohoku Univ. Sendai Jpn
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HOSHIYA Taiji
Oarai Research Establishment, Japan Atomic Energy Research Institute
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Hoshiya Taiji
Oarai Research Establishment Japan Atomic Energy Research Institute
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ARUGA Tetsuya
Department of Chemistry, Graduate School of Science, Kyoto University
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Takamura Saburo
Tokai Research Establishment, Japan Atomic Energy Research Institute
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Kobiyama Mamoru
Faculty of Engineering, Ibaraki University
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Miura Sadahiko
Fundamental Research Laboratories Nec Corporation
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ARUGA Takeo
Tokai Research Establishment, Japan Atomic Energy Research Institute
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SHOHATA Nobuaki
Fundamental Research Laboratories, NEC Corporation
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Aruga T
Kyoto Univ. Kyoto Jpn
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Shohata N
Fundamental Research Laboratories Nec Corporation
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Shohata Nobuaki
Fundamental Res. Labs. And Vlsi Development Div. Nec Corporation
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Takamura S
Tokai Research Establishment Japan Atomic Energy Research Institute
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Kobiyama M
Faculty Of Engineering Ibaraki University
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Kobiyama Mamoru
Faculty Of Engineering Ibaraki University
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