STM Observation of Amorphous Marks in Phase Change Media : FUTURE TECHNOLOGY

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1989-12-25

著者

• YAGI Shuhei

  Department of Physical Electronics, Tokyo Institute of Technology

• Yagi S

  Department Of Physical Electronics Tokyo Institute Of Technology

• Yagi Syuhei

  Department Of Physical Electronics Tokyo Institute Of Technology

• Yamazaki Hiroki

  Ntt Applied Electronics Laboratories

• Yagi S

  Meisei Univ. Tokyo Jpn

• Yamazaki H

  Japan Radio Co. Ltd.

• Fujimori S

  Ntt Interdisciplinary Laboratories

• Fujimori Susumu

  Ntt Applied Electronics Laboratories

• YAGI Shogo

  NTT Applied Electronics Laboratories

• MORITA Kasumi

  NTT Applied Electronics Laboratories

• Fujimori Susumu

  NTT Advanced Technology Corporation, Shinagawa-ku, Tokyo 141-0001, Japan

関連論文

• Substitutional C Incorporation into Si_C_y Alloys Using Novel Carbon Source, 1, 3-Disilabutane
• Phosphorous Doping of Strain-Induced Si_C_y Epitaxial Films Grown by Low-Temperature Chemical Vapor Deposition
• P-Doping into Strain-Induced Si_C_y Epitaxial Films Grown by Low Temperature Chemical Vapor Deposition
• Epitaxial Growth of Si_C_y Film by Low Temperature Chemical vapor Deposition
• Two Adults Requiring Implantable Defibrillators Because of Ventricular Tachycardia and Left Ventricular Dysfunction Caused by Presumed Kawasaki Disease
• Characterization of Tensile Strained Si_1_yCy Alloy Grown by Photo- and Plasma Chemical Vapor Deposition at Very Low Temperature
• Theoretical Analysis of Photoacoustic Signal on PAS Using a Transparent Transducer : Photoacoustic Effect and Spectroscopy
• Consideration on PA Signals of Multilayer Structure Measured by PAS Using Transparent Transducer : Photoacoustic Spectroscopy
• Focusing Method in High-Impedance Material using Transmission Line Coupler : Ultrasonic Transmission Line Coupling Method
• Development of a New System for Measuring Skull Bone Thickness by the Pulse compression Method
• Ultrasonic Flaw Detection for High Impedance Materials Using a Transmission Line Coupling Method
• High Signal-to-Noise Ratio Ultrasonic Point Detection Method using a Fused Quartz Rod as a Pulse Compression Filter and a Sensor
• Measurements of Electroluminescence Intensity Distribution in the Direction of Gate Width of n^+ Self-Aligned Gate GaAs Metal-Semiconductor Field-Effect Transistors
• Electroluminescence Measurement of n^+ Self-Alighed Gate GaAs MESFETs
• Electroluminescence Measurement of n Self-Aligned GaAs MESFETs
• Ultrasonoecho Spectral Moment Tomography : Ultrasonic Imaging and Microscopy
• Holographic Recording in Cerium Doped Strontium Barium Niobate α-Axis Single Crystal Fibers : Future Technology
• Holographic Recording in Cerium Doped Strontium Barium Niobate α-Axis Single Crystal Fibers
• Multispiral Pregrooved Disk Fabricated by a Beam Scanning Method
• Pregrooved Disk Formed by Dry Etching Technique : MEDIA
• C Stability in Si_C_y Epitaxial Films Grown by Low-Temperature Chemical Vapor Deposition
• Photorefractive Properties of Ce-Doped Strontium Barium Niobate Single-Crystal Fibers at 830 nm
• Erasing Characteristics and Crystallization Process of GeSbTe Phase-Change Optical Disk Media at Very Fast Linear Velocities
• STM Observation of Amorphous Marks in Phase Change Media : FUTURE TECHNOLOGY
• Crystallization of Amorphous Marks in SbTe Erasable Optical Storage Media : MEDIA
• Measurements of Flow Velocity and Temperature Profile in A Propane-Oxygen Combustion MHD Channel
• Plasma Temperature Profile in the Boundary Layers of an MHD Channel
• Phase-Change Optical Disks with High Writing Sensitivity Using a-SiN:H Protective Films Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition
• Fine Pattern Fabrication by the Molded Mask Method (Nanoimprint Lithography) in the 1970s

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