Silicon Nanoparticle Formation in Si^+ -implanted Thermal Oxide Films and Visible Photoluminescence Behavior
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-02-15
著者
-
Saitoh K
National Industrial Research Institute Of Nagoya
-
Nakao Shin-ichi
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University:laboratory For
-
Saitoh Kazuo
National Industrial Research Institute Of Nagoya
-
SHIMIZU-IWAYAMA Tsutomu
Department of materials science, Aichi University of Education
-
NAKAO Setsuo
National Industrial Research Institute of Nagoya
-
Shimizu-iwayama Tsutomu
Department Of Materials Science Aichi University Of Education
-
Nakao S
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University:laboratory For
関連論文
- Silicon Nanoparticle Formation in Si^+ -implanted Thermal Oxide Films and Visible Photoluminescence Behavior
- Investigations on the Formation of SiO_2 in Si^+-Implanted Al_2O_3
- Estimation of Inductance for High-T_c dc-SQUID's in Coplanar Waveguide
- Logic Operation Using a High T_c Coupled Superconducting Quantum Interference Device
- Characterization of Neutron Elastic Recoil Detection Analysis with Low-Energy Neutron Beams
- Annealing of Silica Glasses Implanted with High-Energy Copper Ions
- Effect of High-Energy Carbon Ion Irradiation in Aligned and Random Directions on Microstructure of (111) Au Films
- Damage Production and Reduction of Single-Crystalline TiN Films by 1.8 MeV Carbon Beam Irradiation
- Ion Beam Induced Damage in Epitaxial TiN Films
- Contamination of Evaporated Fluoride Films by 1 MeV Proton Bombardment
- Thin and Low-Resistivity Tantalum Nitride Diffusion Barrier and Giant-Grain Copper Interconnects for Advanced ULSI Metallization
- Thin and Low-Resistivity Tantalum Nitride Diffusion Barrier and Giant-Grain Copper Interconnects for Advanced ULSI Metallization
- Effect of Discharge Current on the Microstructure of Diamond Films Deposited on Aluminum Substrate at Low Substrate Temperature by DC Plasma CVD
- Thermal Stability of SiBCN Films
- Preparation of MAX-Phase-Containing Ti--Si--C Thin Films by Magnetron Sputtering Using Elemental Targets
- Surface Modification of Stainless Steel with Ti--Si--C Thin Films by Magnetron Sputtering Using Elemental Targets at Low Preparation Temperatures