Application of Mark Detection Using the Vibration Method to an Electron Beam Exposure System

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1995-02-15

著者

• SHIMAZU Nobuo

  NTT System Electronics Laboratories

• SHIMAZU Nobuo

  NTT LSI Laboratories

• Shimazu N

  Ntt Lsi Lob. Kanagawa Jpn

• Takamoto Kiichi

  Ntt Lsi Laboratories

関連論文

• A Beam Drift Reduction Device for the X-Ray Mask E-Beam Writer, EB-X2
• Basic Characteristics of Beam Position Drift and Field Stitching Error Caused by Electron Beam Column Charging
• A 100 kV Electron Gun for the X-Ray Mask Writer, EB-X2
• An Approach to a High-Throughput E-Beam Writer with a Single-Gun Multiple-Path System
• Application of Mark Detection Using the Vibration Method to an Electron Beam Exposure System
• Imaging in an Optical Projection System with a Laser Light Source. I : Gaussian Laser Light Illumination
• Proximity Effect Correction for X-Ray Mask Fabrication
• Imaging in an Optical Projection System with a Light Source Composed of Point Sources

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