New Cryostat for Applying Uniaxial Stress
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概要
- 論文の詳細を見る
A novel pressure device for applying uniaxial stress is described, which is used at low temperatures. The uniaxial stress is applied by a spring immediately adjacent to the sample. The sample stress is precisely determined from the contraction of the spring and the spring constant. The main advantage of this apparatus is that the friction of the pressure-transmitting medium does not cause an uncertainty in the determination of the actual sample stress.
- 社団法人応用物理学会の論文
- 1994-10-15
著者
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Shimazu Yoshihiro
Department Of Physics Faculty Of Engineering Yokohama National University
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Shimazu Yoshihiro
Department Of Physics Graduate School Of Science University Of Tokyo
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IKEHATA Seiichiro
Department of Applied Physics, Faculty of Science, Science University of Tokyo
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Ikehata Seiichiro
Department Of Physics Graduate School Of Science University Of Tokyo
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