Influence of Secondary Electron Emission on the Characteristics of Langmuir Probes
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-09-15
著者
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FUCHS Gerhard
Institut fur Plasma Physik Assoc. EURATOM-KFA
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Fuchs Gerhard
Institut Fur Plasmaphysik Kfa Julich Gmbh
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AMEMIYA Hiroshi
RIKEN (The Institute of Physical and Chemical Research)
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- Optogalvanic Measurement of Negative Ions in Plasma by Semiconductor Lasers
- An Optimum Condition of Multipole Field for an ECR-Type Jon Source
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- Measurement of Negative Ions by Photodetachment with YAG Laser in Discharge Plasmas
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- Production of Negative Ion-Rich Plasma by Using a Magneric Filter in Oxygen
- Measurement of Negative Ions in the D-Layer by a Sounding Rocket
- Plasma Dispersion for Druyvesteyn Type Velocity Distribution
- Electron Energy Distribution in Multicusp-Type ECR Plasma
- Measuring Method for Ion Temperature by Asymmetric Probes in Magnetic Fields
- Tangential SX Imaging for Visualization of Fluctuations in Toroidal Plasmas
- Production of Electron-Free Plasma by Using a Magnetic Filter in Radio Frequency Discharge