AMEMIYA Hiroshi | RIKEN (The Institute of Physical and Chemical Research)

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概要

• 同名の論文著者
• RIKEN (The Institute of Physical and Chemical Research)の論文著者

関連著者

• AMEMIYA Hiroshi

  RIKEN (The Institute of Physical and Chemical Research)

• Suzuki Takanori

  RIKEN

• FUCHS Gerhard

  Institut fur Plasma Physik Assoc. EURATOM-KFA

• SHIGUEOKA Yoshyuki

  RIKEN (The Institute of Physical and Chemical Research)

• ISHII Shigeyuki

  RIKEN (The Institute of Physical and Chemical Research)

• 雨宮 宏

  中央大学大学院理工学部

• 雨宮 宏

  理化学研究所

• Fuchs G

  Kfa Fuelich Deu

• Ishii Shozo

  Tokyo Institute Of Technology

• Amemiya Hiroshi

  Department Of Experimental Surgery And Bioengineering National Children's Medical Research Cent

• Ishii Shozo

  Department Of Electrical And Electronic Engineering Tokyo Instutute Of Technology

• Fuchs Gerhard

  Institut Fur Plasmaphysik Kfa Julich Gmbh

• ISHII Shigeyuki

  Toyama Prefectural University

• Amemiya H

  Inst. Physical And Chemical Res. (riken) Saitama Jpn

• NAKAMURA Yoshiharu

  SAS(The Institute of Space and Astronautical Science)

• Ishii S

  Univ. Tsukuba Tsukuba Jpn

• Yanokura Minoru

  Riken (the Institute Of Physical And Chemical Research)

• Nakamura Y

  Sas(the Institute Of Space And Astronautical Science)

• NAKAMURA Yoshiharu

  ISAS (The Institute of Space and Astronautical Science)

• Amemiya Hiroshi

  Riken(the Institute Of Physical And Chemical Research)

• Nakamura Yoshiharu

  Isas(the Institute Of Space And Astronautical Science)

• Suzuki Takanori

  Riken (the Institute Of Physical And Chemical Research)

• Amemiya Hiroshi

  RIKEN (The Institute of Physical and Chemical Research), Wakoshi, Hirosawa, Saitama 351-01

• Amemiya Hiroshi

  RIKEN (The Institute of Physical and Chemical Research), Wako-shi, Hirosawa, Saitama 351-01

• Ishii Shigeyuki

  RIKEN (The Institute of Physical and Chemical Research), Wako-shi, Hirosawa, Saitama 351-01

• FUCHS Gerhard

  Institut fuer Plasmaphysik, Forschungszentrum Juelich, D-52425, Germany

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著作論文

• Multicusp Type Electron Cyclotron Resonance Ion Source for Plasma Processing
• Measurement of Negative Ions in the Lower Ionosphere(D-Layer)in the Polar Regin
• Influence of Secondary Electron Emission on the Characteristics of Langmuir Probes
• Range of Application for Asymmetric Double Probes
• Optogalvanic Measurement of Negative Ions in Plasma by Semiconductor Lasers
• An Optimum Condition of Multipole Field for an ECR-Type Jon Source
• Laser-Assisted Probing Method for Measuring Negative Ions in Plasmas
• Negative Ion-Sensitive Probe : Nuclear Science, Plasmas and Electric Discharges
• Measurement of Negative Ions by Photodetachment with YAG Laser in Discharge Plasmas
• Characteristics of Double Probe in Negative Ion-Containing Plasmas
• Production of Negative Ion-Rich Plasma by Using a Magneric Filter in Oxygen
• Measurement of Negative Ions in the D-Layer by a Sounding Rocket
• Plasma Dispersion for Druyvesteyn Type Velocity Distribution
• Electron Energy Distribution in Multicusp-Type ECR Plasma
• Measuring Method for Ion Temperature by Asymmetric Probes in Magnetic Fields
• Production of Electron-Free Plasma by Using a Magnetic Filter in Radio Frequency Discharge

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