Influence of Sputtering Conditions on the Characteristics of Superconducting Y-Ba-Cu-O Films
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概要
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Influences of the substrate holder bias voltage V_H, the oxygen partial pressure P_<O2>, and the distance D between the substrate and the target on the superconducting characteristics of Y-Ba-Cu-O thin films were investigated. The optimum bias voltages were from -10V to -20V for total gas pressure P=300-500 mTorr. With increasing distance at P=500 mTorr, the critical temperature T_c increased and the c-lattice parameter c_0 decreased. However, at D longer than 50 mm, the values of T_c and c_0 did not depend on D. These films have the maximum T_c of 90 K and the c-lattice parameter ranging from 1.167 to 1.169 nm. These results imply that the sputtering conditions of P_<O2>≥300 mTorr, V_H of -10V to -20V and D>5 cm at 500 mTorr are necessary for fabricating the films having T_c of 87-90 K by means of on-axis rf magnetron sputtering having a YBa_2Cu_3O_z target.
- 社団法人応用物理学会の論文
- 1993-07-15
著者
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Kato Y
Department Of Communications And Systems The University Of Electro-communications(present Address):i
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Usami Kouichi
Faculty of Electro-Communications, The University of Electro-Communications
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Usami K
Faculty Of Electro-communications The University Of Electro-communications
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Goto Toshinari
Department Of Communications And Systems The University Of Electro-communications
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Kato Yoshihito
Department Of Communications And Systems The University Of Electro-communications(present Address):i
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Kobayashi Tadayuki
Department Of Communications And Systems The University Of Electro-communications
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Usami Kouichi
Department of Electronic Engineering, The University of Electro-Communications, 1-5-1 Chofugaoka, Ch
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ETO Satoshi
Department of Communications and Systems, The University of Electro-Communications(Present address)
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Eto Satoshi
Department Of Communications And Systems The University Of Electro-communications(present Address):f
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