Depth Profiling of As in an AlAs/GaAs Multilayer by a New Laser-Induced Sputtered Neutral Mass Spectrometry System
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-02-15
著者
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Homma Y
Ntt Interdisciplinary Res. Lab. Tokyo Jpn
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Maruo T
Ntt Interdisciplinary Research Laboratories
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HOMMA Yoshikazu
NTT Basic Research Laboratories
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HIGASHI Yasuhiro
NTT Interdisciplinary Research Laboratories
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MARUO Tetsuya
NTT Interdisciplinary Research Laboratories
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TANAKA Tohru
NTT Interdisciplinary Research Laboratories
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HOMMA Yoshikazu
NTT Interdisciplinary Research Laboratories
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Homma Yoshikazu
NTT Interdisciplinary Labs., Midori-cho, Musashino 180, Japan
関連論文
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- Control of island formation on silicon surfaces using ultra-high-vacuum scanning electron microscopy
- Depth Profiling of As in an AlAs/GaAs Multilayer by a New Laser-Induced Sputtered Neutral Mass Spectrometry System
- Application of Thermal Desorption Spectroscopy to the Study of Defects Induced by Arsenic Implantation
- Low-Acceleration-Voltage Electron Irradiation Damage in Single-Walled Carbon Nanotubes
- Observation of Incomplete Surface Melting of Si Using Medium-Energy Ion Scattering Spectroscopy
- In Situ Observation of Surface Morphology Evolution Corresponding to Reflection High-Energy Electron Diffraction Oscillation during Molecular Beam Epitaxy of Gallium Arsenide
- Patterning-Assisted Control for Ordered Arrangement of Atomic Steps on Si(111) Surfaces
- In Situ Observation of Monolayer Steps during Molecular Beam Epitaxy of Gallium Arsenide by Scanning Electron Microscopy
- Ultra-Large-Scale Step-Free Terraces Formed at the Bottom of Craters on Vicinal Si(111) Surfaces
- Stability of Relative Sensitivity Factors in Secondary Ion Mass Spectrometry
- Quantitative Analysis Using Secondary Ion Mass Spectrometry
- Drastic Improvement in Surface Flatness Properties by Using GaAs (111) A Substrates in Molecular Beam Epitaxy
- Application of Thermal Desorption Spectroscopy to the Study of Defects Induced by Arsenic Implantation
- Low-Acceleration-Voltage Electron Irradiation Damage in Single-Walled Carbon Nanotubes
- Stiffness of Step Bunches on Si(111)