Estimation of Chemical Sputtering Rates of Carbon in He-H_2 Glow Discharge Plasmas by Optical Emission Spectroscopy

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概要

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• The sputtering of cathode plates in glow discharge plasma with He-H_2 gas mixtures has been investigated. The sputtering rate of the carbon plate alone increased with increasing H_2 pressure. This enhancement in the sputtering rate of carbon can be explained by chemical sputtering with H^+ ions dissociated from H_2 molecules. The dependence of optical emission intensities of CH and C_2 molecules on H_2 pressure was very similar to that of the sputtering rate of carbon. Thus, correlation between the sputtering rate of carbon and the optical emission intensity was investigated. It has been found that the correlation between the sputtering rate of carbon and the intensity ratio I(CH 431.4 nm)/I(He I 501.6 nm) gave the best correlation coefficient. Therefore, it is possible to estimate the chemical sputtering rate of carbon by monitoring the emission intensities of CH 431.4 nm and He I 501.6 nm.

• 社団法人応用物理学会の論文
• 1993-02-15

著者

• HIROKAWA Kichinosuke

  Institute for Materials Research, Tohoku University

• Tsuji K

  Tohoku Univ. Sendai Jpn

• Tsuji Kouichi

  Institute For Materials Research Tohoku University

• Hirokawa K

  Tohoku Univ. Sendai Jpn

• Hirokawa Kichinosuke

  Institute For Materials Research Tohoku University

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