Effects of Hydrogen Incorporation during Deposition by Sputtering for Amorphous Gallium Phosphide Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1979-05-05
著者
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Matsumoto Nobuo
Musashino Electrical Communication Laboratory Nippon Telegraph Ad Telephone Public Corporation
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Kumabe Kenji
Musashino Electrical Communication Laboratory Nippon Telegraph Ad Telephone Public Corporation
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- Influence of Structure Parameters on Lasing Characteristics of Semiconductor Lasers
- Effects of Hydrogen Incorporation during Deposition by Sputtering for Amorphous Gallium Phosphide Films
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