The Enhancement of Anomalously Transmitted X-Ray Intensity by Asymmetric Diffraction and Its Application to Si Wafer Evaluation

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1978-11-05

著者

• Kishino Seigo

  Cooperative Laboratories Vlsi Technology Research Association

• Yoshihiro Naotsugu

  Cooperative Laboratories Vlsi Technology Research Association

• Iizuka Takashi

  Cooperative Laboratories Vlsi Technology Research Association

関連論文

• Photoluminescence Analysis of 'New Donors' in Silicon
• Photoluminescence Analysis of Annealed Silicon Crystals
• Photoluminescence Spectra of Thermal Donors in Silicon
• Heavy Metal Gettering by an Intrinsic Gettering Technique Using Microdefects in Czochralski-Grown Silicon Wafers
• A Study on Thermally Induced Microdefects in Czochralski-Grown Silicon Crystals : Dependence on Annealing Temperature and Starting Materials
• The Enhancement of Anomalously Transmitted X-Ray Intensity by Asymmetric Diffraction and Its Application to Si Wafer Evaluation
• Thermally Induced Microdefects in Czochralski-Grown Silicon : Nucleation and Growth Behavior

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