Mean Free Path of Fast Electrons for Plasmon Excitation in a Single Crystal
スポンサーリンク
概要
- 論文の詳細を見る
The mean free path of 40-100KeV electrons for plasmon excitation was measured by analysing energy spectra of bright field images of aluminum single crystal. Equal thickness fringes by (111) reflection were used to measure the specimen thickness. It was found that the mean free path slightly depends on the crystal orientation, and its voltage dependence at the exact Bragg condition agrees qualitatively well with Ferrell's theory (Phys. Rev. 101 (1956). 554).
- 社団法人応用物理学会の論文
- 1967-10-05
著者
-
Tonomura Akira
Central Rasearch Lab Hitachi Ltd.
-
Tonomura Akira
Central Research Lab. Hitachi Ltd.
-
WATANABE Hiroshi
Central Research Lab. Hitachi Ltd.
関連論文
- Interference Electron Microscopy by Means of Holography
- Spherical-Aberration Correction of an Electron Lens by Holography
- High Resolution Electron Holography with Field Emission Electron Microscope
- Electron Energy Loss of Rare Earth Vanadates:RVO_4(R=Sc,Y,La,Eu and Gd)
- A New Method for Micro-Area Electron Diffraction by Electron Holography
- Observation of Lattice Images with a Field Emission Electron Microscope
- The Electron Interference Method for Magnetization Measurement of Thin Films
- Two Beam Interference with Field Emission Electron Beam
- Mean Free Path of Fast Electrons for Plasmon Excitation in a Single Crystal
- Optimum Design of Accelerating Electrodes for a Field Emission Electron Gun
- Optical Reconstruction of Image from Fraunhofer Electron-Hologram
- A Liquid Helium Cooled Stage for an Electron Microscope
- Die Verteilung des durch einen Elektronenstrahl ionisierten Ionenstromes im Elektronenstrahl-Apparate
- Measurement of Resistance by Means of Electron Beam -III-
- Measurement of Resistance by Means of Electron Beam -II-