The Electron Interference Method for Magnetization Measurement of Thin Films
スポンサーリンク
概要
- 論文の詳細を見る
The electron interference method is discussed which enables to measure the distribution of magnetization in a magnetic thin film. The phase distribution of the transmitted electron wave just behind the film has the information of the magnetization, so one can measure the magnetization from the interference pattern (hologram) between object wave and reference wave. Interference patterns are calculated when 180゜ domain walls in a ferromagnetic thin film are crossed with the electron biprism. The phase change of transmitted wave corresponding to the magnetization distribution of 180゜ domain walls was experimentally detected by this method, and the observed interference patterns agreed qualitatively with those calculated.
- 社団法人応用物理学会の論文
- 1972-04-05
著者
関連論文
- Interference Electron Microscopy by Means of Holography
- Spherical-Aberration Correction of an Electron Lens by Holography
- High Resolution Electron Holography with Field Emission Electron Microscope
- Electron Energy Loss of Rare Earth Vanadates:RVO_4(R=Sc,Y,La,Eu and Gd)
- A New Method for Micro-Area Electron Diffraction by Electron Holography
- Observation of Lattice Images with a Field Emission Electron Microscope
- The Electron Interference Method for Magnetization Measurement of Thin Films
- Two Beam Interference with Field Emission Electron Beam
- Mean Free Path of Fast Electrons for Plasmon Excitation in a Single Crystal
- Optimum Design of Accelerating Electrodes for a Field Emission Electron Gun
- Optical Reconstruction of Image from Fraunhofer Electron-Hologram