The Role of a Photoresist Film on Reverse Gas Plasma Etching of Chromium Films
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1980-07-05
著者
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NAKATA Hidefumi
LSI Development Laboratory, Mitsubishi Electric Corporation
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Uno Jun
Lsi Development Laboratory Mitsubishi Electric Corporation
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YAMAZAKI Teruhiko
LSI Development Laboratory, Mitsubishi Electric Corporation
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SUZUKI Yoshiki
LSI Development Laboratory, Mitsubishi Electric Corporation
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Suzuki Yoshiki
Lsi Research And Development Laboratory Mitsubishi Electric Corporation
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Nakata Hidefumi
Lsi Research And Development Laboratory Mitsubishi Electric Corporation
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Nakata Hidefumi
Lsi Development Laboratory Mitsubishi Electric Corp.
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Yamazaki Teruhiko
Lsi Research And Development Laboratory Mitsubishi Electric Corporation
関連論文
- A Three-Dimensional Study of the Absorbed Energy Density in Electron-Resist Films on Substrates
- The Role of a Photoresist Film on Reverse Gas Plasma Etching of Chromium Films
- Gas Plasma Etching of Chromium Films
- X-Ray Lithography Using Chlorinated Polymethylstyrene (CPMS) as a Negative X-Ray Resist
- A New Transistor Structure for High Speed Bipolar LSI : A-4: LSI DEVICES
- Loading Effect and Temperature Dependence of Etch Rate in CF_4 Plasma
- An All Dry Mask Making Process by Reverse Gas Plasma Etching
- An All Dry Mask Making Process by Gas Plasma