A Three-Dimensional Study of the Absorbed Energy Density in Electron-Resist Films on Substrates
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1978-10-05
著者
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Nomura Eiichi
Electronics Department College Of Engineering University Of Osaka Prefecture
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MURATA Kenji
Electronics Department, College of Engineering, University of Osaka Prefecture
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NAGAMI Koichi
Electronics Department, College of Engineering, University of Osaka Prefecture
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KATO Takaaki
LSI Development Laboratory, Mitsubishi Electric Corporation
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NAKATA Hidefumi
LSI Development Laboratory, Mitsubishi Electric Corporation
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Nagami Koichi
Electronics Department College Of Engineering University Of Osaka Prefecture
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Nakata Hidefumi
Lsi Development Laboratory Mitsubishi Electric Corporation
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Nakata Hidefumi
Lsi Development Laboratory Mitsubishi Electric Corp.
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Murata Kenji
Electronics Department College Of Engineering University Of Osaka Prefecture
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Kato Takaaki
Lsi Development Laboratory Mitsubishi Electric Corporation
関連論文
- Fundamental Studies of the Interproximity Effect in Electron-Beam Lithography
- A Three-Dimensional Study of the Absorbed Energy Density in Electron-Resist Films on Substrates
- The Role of a Photoresist Film on Reverse Gas Plasma Etching of Chromium Films
- A Simple Quantitative Electron Microprobe Analysis of Multielement Thin Films on Substrate
- A New Transistor Structure for High Speed Bipolar LSI : A-4: LSI DEVICES
- Loading Effect and Temperature Dependence of Etch Rate in CF_4 Plasma
- Remarks on the Calculation of Energy Loss in Electron-Resist Films on Substrates