An All Dry Mask Making Process by Reverse Gas Plasma Etching

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1982-10-20

著者

• Nakata Hidefumi

  Lsi Research And Development Laboratory Mitsubishi Electric Corporation

• Yamazaki Teruhiko

  Lsi R & D Laboratory Mitsubishi Electric Corporation

• TANAKA Kazuhiro

  LSI Research and Development Laboratory, Mitsubishi Electric Corporation

• Tanaka Kazuhiro

  Lsi Research And Development Laboratory Mitsubishi Electric Corporation

関連論文

• The Role of a Photoresist Film on Reverse Gas Plasma Etching of Chromium Films
• A High-Capacitance Trench Structure (Hi-CAT) for Megabit LSI Memories
• Gas Plasma Etching of Chromium Films
• X-Ray Lithography Using Chlorinated Polymethylstyrene (CPMS) as a Negative X-Ray Resist
• An All Dry Mask Making Process by Reverse Gas Plasma Etching
• An All Dry Mask Making Process by Gas Plasma

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