Gas Plasma Etching of Chromium Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1982-09-20
著者
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Suzuki Yoshiki
Lsi Research And Development Laboratory Mitsubishi Electric Corporation
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Suzuki Yoshiki
Lsi R & D Laboratory Mitsubishi Electric Corporation
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YAMAZAKI Teruhiko
LSI R&D Laboratory, Mitsubishi Electric Corporation,
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Nakata Hidefumi
Lsi Research And Development Laboratory Mitsubishi Electric Corporation
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Yamazaki Teruhiko
Lsi Research And Development Laboratory Mitsubishi Electric Corporation
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Yamazaki Teruhiko
Lsi R & D Laboratory Mitsubishi Electric Corporation
関連論文
- The Role of a Photoresist Film on Reverse Gas Plasma Etching of Chromium Films
- A High-Capacitance Trench Structure (Hi-CAT) for Megabit LSI Memories
- Gas Plasma Etching of Chromium Films
- X-Ray Lithography Using Chlorinated Polymethylstyrene (CPMS) as a Negative X-Ray Resist
- An All Dry Mask Making Process by Reverse Gas Plasma Etching
- An All Dry Mask Making Process by Gas Plasma