Deposited Cr_2O_3 as a Barrier in a Solid State WO_3 Electrochromic Cell
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1977-11-05
著者
-
Izawa Akira
Imaging Science And Engineering Laboratory Tokyo Institute Of Technology
-
INOUE Eiichi
Imaging Science and Engineering Laboratory, Tokyo Institute of Technology
-
KAWAZIRI Kazuhiro
Imaging Science and Engineering Laboratory, Tokyo Institute of Technology
-
Inoue Eiichi
Imaging Science And Engineering Laboratory Tokyo Institute Of Technology
-
Kawaziri Kazuhiro
Imaging Science And Engineering Laboratory Tokyo Institute Of Technology
関連論文
- Deposited Cr_2O_3 as a Barrier in a Solid State WO_3 Electrochromic Cell
- Anomalous Photoresponse of Tetrazolium-ZnO System
- Electrochromic Display Device Based on Amorphous WO_3 and Solid Proton Conductor
- Influence of the Localized Structural Transformation of As_2S_3 on the Photo-Doping Rate of Ag
- Improvement in Open-Circuit Memory, Current Efficiency and Response Speed of an Amorphous WO_3 Solid-State Electrochromic Device
- Preparations of a-Si: H from Higher Silanes (Si_nH_) with the High Growth Rate
- Application of Amorphous Silicon to WO_3 Photoelectrochromic Device
- Solid-State Electrochromic Device Consisting of Amorphous WO_3 and Various Thin Oxide Layers
- Coloration Process in Solid-State Eleetrochromic Device
- A New Method for Producing Low-electrical-resistivity Patterns in Insulating Chalcogenide Glasses
- Dye-sensitized Photolysis of Diazonium Compounds in the Presence of Thioacetamide
- The Optical and Electrical Properties of Metal Photodoped Chalcogenide Glasses
- The Photo-Erasable Memory Switching Effect of Ag Photo-Doped Chalcogenide Glasses
- Photoelectrical Response of Hydrochloric Salt of Photospiran
- Photosensitive Systems Involving Photoconduction and Photochromism
- The Dye-sensitized Photolysis of Hexamethyleneammonium Hexamethylenedithiocarbamate by Thiazine Dyes