Reflection Electron Diffraction of Gold-Diffused Silicon

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1972-06-05

著者

• Yoshida Masayuki

  Electrical Communication Laboratory

• Hirota Shoichi

  Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation

関連論文

• Determination of Diffusion Coefficient of Phosphorus in Silicon by Boltzmann-Matano's Method
• Electron Microscope Study of the Decomposition Process of Oxide Coated Cathodes
• Observations of Dislocations in Phosphorus-Diffused Silicon by X-Ray and Etching Techniques
• Behavior of Nickel as an Impurity in Silicon
• Numerical Solutions of Basic Equations of Dissociative Diffusion
• Dissociative Diffusion of Nickel in Silicon and Self-Diffusion of Silicon
• Reflection Electron Diffraction of Gold-Diffused Silicon
• Dissociative Diffusion of Gold in Silicon
• Retardation of Diffusion by Diffusion-Induced Dislocation in Silicon
• Criterions for the Assumptions of Thermal Equilibrium of Interstitial Atoms and of Vacancies in Dissociative Diffusion

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