250 Mbyte/s Synchronous DRAM Using a 3-Stage-Pipelined Architecture (Special Section on the 1993 VLSI Circuits Symposium (Joint Issue with the IEEE Journal of Solid-State Circuits, Vol.29, No.4 April 1994))
スポンサーリンク
概要
- 論文の詳細を見る
A 3.3-V 512-k x 18-b x 2-bank synchronous DRAM (SDRAM) has been developed using a novel 3-stage-pipelined architecture. The address-access path which is usually designed by analog means is digitized, separated into three stages by latch circuits at the column switch and data-out buffer. Since this architecture requires no additional read/write bus and data amp, it minimizes an increase in die size. Using the standardized GTL interface, a 250-Mbyte/s synchronous DRAM with die size of .7-mm^2, which is the same die size as our conventional DRAM, has been achieved with 0.50-μm CMOS process technology.
- 社団法人電子情報通信学会の論文
- 1994-05-25
著者
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Obara Takashi
Lsi Memory Division Nec Corporation
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Watanabe H
Toyama Medical And Pharmaceutical Univ. Toyama Jpn
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Kobayashi Yasuaki
Lsi Memory Division Nec Corporation
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Takai Yasuhiro
LSI Memory Division, NEC Corporation
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Nagase Mamoru
LSI Memory Division, NEC Corporation
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Kitamura Mamoru
LSI Memory Division, NEC Corporation
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Koshikawa Yasuji
LSI Memory Division, NEC Corporation
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Yoshida Naoyuki
LSI Memory Division, NEC Corporation
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Fukuzo Yukio
ULSI Device Development Laboratories, NEC Corporation
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Watanabe Hiroshi
LSI Memory Division, NEC Corporation
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Kitamura Mamoru
Lsi Memory Division Nec Corporation
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Fukuzo Yukio
Ulsi Device Development Laboratories Nec Corporation
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Nagase Mamoru
Lsi Memory Division Nec Corporation
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Takai Y
Hokkaido Univ. Sapporo‐shi Jpn
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Koshikawa Yasuji
Lsi Memory Division Nec Corporation
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Yoshida N
Discovery Research Laboratories I Dainippon Pharmaceutical Co. Ltd.
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