Co-planar Josephson Junction Using Nonsuperconductive YBaCuO Formed on Very Locally Damaged Substrate by FIB
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概要
- 論文の詳細を見る
A YBaCuO-Nonsuperconductive YBaCuO-YBaCuO coplanar Josephson junction has been fabricated, using Nonsuperconductive YBaCuO thin film deposited on an MgO(100) substrate with intentional and very local damage which was created by Focused Ion Beam. The YBaCuO grown on the damaged section of the substrate turned out to be nonsuperconductor, due to implanted Ga ions and the change in the crystal quality, facilitating formation of an S-N-S junction. We found the important fact that the critical current density decreased exponentially with inverse of the junction length which was changed from 0.2 to 1μm, and that Ga ion was detected in the thin films of the junctions, and that the thin films of the junctions were formed by a mixture of an amorphous, a polycrystal and a crystal, which is confirmed by Transmission Electron Diffraction. And the damaged substrate gave rise to Ga segregation and the mixed crystal, which played an very important role to form the normal metallic YBCO thin film of the Josephson junction. All these facts are related with the S-N-S junctions.
- 社団法人電子情報通信学会の論文
- 1995-05-25
著者
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SOUTOME Yoshihisa
Advanced Research Laboratory, Hitachi Ltd.
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Okabe Y
Univ. Tokyo Tokyo Jpn
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OKABE Yoichi
Research Center for Advanced Science and Technology, The University of Tokyo
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SOUTOME Yoshihisa
Research Center for Advanced Science and Technology, The University of Tokyo
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Kim Yunnghee
Research Center for Advanced Science and Technology, The University of Tokyo
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Kimura Hiroshi
Research Center for Advanced Science and Technology, The University of Tokyo
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Soutome Y
Advanced Research Laboratory Hitachi Ltd.
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Okabe Yoichi
Research Center For Advanced Science And Technology The University Of Tokyo
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Kim Yunnghee
Research Center For Advanced Science And Technology The University Of Tokyo
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Kimura Hiroshi
Research Center For Advanced Science And Technology The University Of Tokyo
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