Pulsed Filtered Vacuum Arc Deposition of ta-C Films
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概要
- 論文の詳細を見る
Tetrahedral amorphous carbon(ta-C)films were prepared using a pulsed filtered vacuum arc deposition system at various substrate bias voltages. The Roman results confirmed that these ta-C films exhibited high sp^3 fraction of over 80%. The hardness, elastic modulus and compressive stress of the films were up to 47 GPa, 261 GPa and 17 GPa, respectively. The friction coefficient and wear rate of the films were as low as 〜0.085 and 4x10^-8 mm^3N^-1m^-1. The thermal stability of these films after vacuum annealing was also studied. The Raman results showed that the sp^3 fraction remained to be higher than 80% even after RTA at 900℃, meanwhile photoelasticity results showed that there was significant stress relaxation after annealing.
- 社団法人電子情報通信学会の論文
- 2000-11-07
著者
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Wong S.p.
Department Of Electronic Engineering And Materials Science And Technology Research Center The Chines
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Ke N
Department Of Electronic Engineering And Materials Science And Technology Research Center The Chines
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Wong S.
Department Of Chemistry The University Of Western Ontario
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Cheung W.y.
Department Of Electronic Engineering And Materials Science And Technology Research Center The Chines
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Cheung W.
Department Of Electronic Engineering & Materials Science And Technology Research Centre The Chin
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Ke N.
Department of Electronic Enginneering The Chinese University of Hong Kong
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Wu X.y.
Department Of Electronic Engineering The Chinese University Of Hong Kong
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Ke N.
Department Of Electronic Engineering And Materials Science And Technology Research Center The Chines
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Lau W.f.
Department Of Electronic Engineering The Chinese University Of Hong Kong
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Wu Z.
Department Of Epidemiology Beijing Institute Of Heart Lung And Blood Vessel Diseases
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Lau W.
Department Of Chemical Engineering National Universityt Of Singapore
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