高密度パターンドメディア用磁性微粒子アレイの作製 : 垂直磁気記録媒体

概要

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We fabricated magnetic rectangular block arrays of 130 and 260 Gblock/in^2 by using focused ion beam lithography. The ratios R of the total block area to the array area are 0.73 and 0.64, respectively. The magnetic domain boundaries of the arrays run along the grooves between the blocks, Each block has a single domain structure and perpendicular magnetic anisotropy. The patterning increased the squareness from 0.2 of the continuous film to 0.87 of the array with 130 Gblock/in^2. Application of the block arrays to high-density patterned magnetic recording media is discussed.
社団法人日本磁気学会の論文
2002-04-01