125 Study on Particle Detection for Patterned Wafers by Evanescent Light Illumination : Evanescent Light Scattering Simulation by means of FDTD Method
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概要
- 論文の詳細を見る
The conventional defects inspection technology can't apply to an inspection technique of patterned wafers for the next generation semiconductors, because of physical limits imposed by the wavelength of incident beam. So, we attend to particles existing on the patterned wafer that particularly affects the yield and propose new optical detection for evaluating the nano-particles by using evanescent light based on near field optics. In this paper, to verify the feasibility of this proposed method, computer simulation was performed by means of FDTD method based on Maxwell's equations. The results show that the proposed method is effective for detecting particle (100nm in a diameter) on patterned wafer of 100nm lines and spaces.
- 一般社団法人日本機械学会の論文
著者
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Miyoshi Takashi
Department of Mechanical Engineering and Systems, Osaka University
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Miyoshi Takashi
Department Of Mechanical Engineering And Systems Osaka University
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Miyoshi Takashi
Dept. Of Mechanical Engineering And Systems Osaka University
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Takaya Yasuhiro
Dept. Of Mechanical Engineering And Systems Osaka University
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Takahashi Satoru
Department Of Mechanical Engineering And Systems Osaka University
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YOSHIOKA Toshie
Dept. of Mechanical Engineering and Systems, Osaka University
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TAKAHASHI Satoru
Dept. of Precision Engineering, The University of Tokyo
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TAKAMASU Kiyoshi
Dept. of Precision Engineering, The University of Tokyo
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Takamasu Kiyoshi
Dept. Of Precision Engineering The University Of Tokyo
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Yoshioka Toshie
Dept. Of Mechanical Engineering And Systems Osaka University
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