極端紫外線露光技術(<特集>半導体エレクトロニクス)

概要

論文の詳細を見る
A three-aspherical-mirror system for Extreme Ultraviolet Lithography has been developed. The aspherical mirrors were fabricated using the computer controlled optical surfacing (CCOS) process and a phase shift interferometer. The mirrors have figure errors of 0.58 nm and surface roughness of 0.3 nm. In order to obtain a high efficiency mirror, M1 and M2 were coated with a graded d-spacing Mo/Si multilayer and M3 was coated with a uniform d-spacing Mo/Si multilayer. The peak reflectivity was 65% at the wavelength of 13.5 nm. The wavelength matching of each mirror spans 0.45 nm. The mirrors were aligned with a Fizeau-type phase shift interferometer, and a final wavefront error of less than 2nm was achieved. Using this system, exposure experiments were performed. 60 nm L & S patterns on the exposure area of 10mm×10mm were achieved.
社団法人日本材料学会の論文
2002-09-15