Si3_N_4とNiとの反応の速度論

概要

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The kinetics and the mechanism of the reaction of Si_3 N_4 with Ni have been investigated. Using a powdered Si_3N_4-Ni mixture, the reaction rates were measured by means of a thermo-balance in Ar or N_2 gas stream. Reaction products were examined by X-ray diffraction. The reaction of Si_3N_4 with Ni initiated after heating to about 800 K. The reaction product layer was a Ni-Si solid solution below 1073 K and nickel silicides above 1123 K. The reaction rates and the reaction products were independent of the atmosphere. The initial rate was described by the linear rate law. The activation energy was 118 kJ/mol. A chemical reaction may be considered as the rate-determining step. When the Ni particles were covered with the reaction product layer, the kinetics obeyed by the parabolic rate law. The formation of nickel silicide increased the rate constant abruptly. The activation energy changed from 171 kJ/ mol in a regeon of the Ni-Si solid solution to 214 kJ/ mol in the regeon of nickel silicide. The reaction rates of Si_3N_4 With Ni are probably controlled by the diffusion through the reaction layer.
社団法人日本セラミックス協会の論文
1992-06-01