Role of the DC Bias in RF Sputtering Process of Amorphous Gd-Co Films
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概要
- 論文の詳細を見る
A clear evidence is shown that a role of the DC bias in RF sputtering processof Gd -Co amorrhotms film is to uive rise to a rreferential rest>utterinx of Gcl[ fromthe derosited film xvith an aid of rhotoelectron sr>ectra of Gd-Co.
- 社団法人日本物理学会の論文
- 1977-01-15
著者
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Hirano Masahiro
Electrotechnical Laboratory
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TSUSHIMA Tachiro
Electrotechnical Laboratory
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KATAYAMA Toshikazu
Electrotechnical Laboratory
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KOIZUMI Yoshiaki
Nihon University
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KAWAKAMI Motoi
Tokyo Electrical Engineering College
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Koizumi Yoshiaki
Electrotechnical Laboratory:college Of Sci. Engineer. Nihon Univ.
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