<Abstract>Fabrication of Al_<1-x>In_xN films at the Resonance point of Nitrogen-ECR plasma
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概要
著者
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SHIRAISHI Tadashi
Department of Communications, Tokai University
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Ono Yuuki
Course Of Electrical Engineering Tokai University
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INUSHIMA Takashi
Department of Communications Engineering
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Murano Kenji
Course Of Electrical Engineering Tokai University
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YASAKA Shinichi
Kanagawa Industrial Technology Research Institute
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OHOYA Seishirou
Kanagawa Industrial Technology Research Institute
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Inushima Takashi
Department Of Electronics Tokai University
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Shiraishi Tadashi
Department Of Communication Engineering Tokai University
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Shiraishi Tadashi
Department of Chemistry, Faculty of Science, Chiba University
関連論文
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- Chemical Interaction between High-T_c Superconducting Oxides and Alkaline Earth Fluorides
- Fabrication of AlN/Al_2O_3 GHz Band SAW Filter and Simulation Analysis
- Fabrication of Al_In_xN films at the Resonance point of Nitrogen-ECR plasma
- A Comparative Study of Characteristics of Current-Type and Conventional-Type Cationic Bactericides
- Isomerization effect in a-Si:H
- Some Properties of Schottky Barrier Formed on Chalcogenide Amorphous Semiconductor
- Crystal Morphology and Electrical Properties of AlN Grown on 6H-SiC
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- Epitaxial Growth of GaN on Si(111) Substrate using AlN Intermediate Layer
- In-situ Monitoring of AlN Crystal Growth on 6H-SiC by the use of Pyrometer(ABSTRACTS OF PROCEEDINGS OF THE SCHOOL OF INFORMATION TECHNOLOGY AND ELECTRONICS SERIES J TOKAI UNIVERSITY -2003-2004-)
- Superconducting Properties of InN with Low Carrier Density near the Mott Transition